Organized DFMSATO, Takashi; HONMA, Michio; KADOTA, Kazuya et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 737934.1-737934.6Conference Paper

Photomask and next-generation lithography mask technology XVI (8-10 April 2009, Yokohama, Japan)Hosono, Kunihiro.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, various pagings, isbn 978-0-8194-7656-2 0-8194-7656-0Conference Proceedings

Automated Reticle Inspection Data Analysis for Wafer FabsSUMMERS, Derek; GONG CHEN; REESE, Bryan et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 737935.1-737935.10Conference Paper

Economics of Automation for the Design-to-Mask InterfaceERCK, Wesley.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73790U.1-73790U.10Conference Paper

Inspection and repair for imprint lithography at 32nm and belowSELINIDIS, Kosta; THOMPSON, Ecron; SREENIVASAN, S. V et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73790N.1-7379N.12Conference Paper

Semi-Automated Repair Verification of Aerial ImagesPOORTINGA, Eric; SCHERUEBL, Thomas; RICHTER, Rigo et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73792D.1-7379D.7Conference Paper

FIB mask repair technology for EUV maskAMANO, Tsuyoshi; NISHIYAMA, Yasushi; SHIGEMURA, Hiroyuki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73792L.1-73792L.9Conference Paper

Improvement of EUVL Mask Blank Inspection Capability at IntelMA, Andy; LIANG, Ted; PARK, Seh-Jin et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73790I.1-73790I.11Conference Paper

In situ selectivity monitor for dry etch of photomasksTIECHENG ZHOU; CHEN, Jeff; GRIMBERGEN, Michael et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73791T.1-73791T.9Conference Paper

Mask-induced aberration in EUV lithographyNAKAJIMA, Yumi; SATO, Takashi; INANAMI, Ryoichi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73790P.1-73790P.8Conference Paper

Model-Based Assist FeaturesYENIKAYA, Bayram; ALEXANDROV, Oleg; CHEN, Steven et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73792Z.1-73792Z.7Conference Paper

Evaluation for EAPSM life time by ArF pellicle characteristicKANG JOON SEO; JI SUN RYU; GOO MIN JEONG et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73791S.1-73791S.7Conference Paper

Novel Absorber Material for EUV Lithography MaskMATSUO, Tadashi; KANAYAMA, Koichiro; OKUMOTO, Yasuhiro et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 7379G.1-7379G.8Conference Paper

PROGRESS OF UV-NIL TEMPLATE MAKINGHIRAKA, Takaaki; MIZUOCHI, Jun; NAKANISHI, Yuko et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73792S.1-73792S.12Conference Paper

Selective Removal of Persistent Particles with No Photomask DamageROBINSON, Tod; BOZAK, Ron; WHITE, Roy et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73791J.1-7379J.7Conference Paper

Adhesion control between resist patterns and photomask blank surfacesKURHARA, Masaaki; HATAKEYAMA, Sho; OHTANI, Hiroyuki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73790A.1-73790A.8Conference Paper

Haze growth on reticles - what's the RigHT thing to do?MCDONALD, Steven M; CHALOM, Daniel V; GREEN, Michael J et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73790F.1-73790F.8Conference Paper

Investigation of the develop process for high precision patterningWATANABE, Junichi; YAMAZAKI, Tsukasa; TANABE, Masahito et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73790B.1-73790B.11Conference Paper

Study of the Pattern Categorization Method in Verification of OPC PatternNAOE, Mitsufumi; MIYAUCHI, Toru; MAKINO, Seiji et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 737933.1-737933.7Conference Paper

Actinic Mask Inspection using an Extreme Ultraviolet MicroscopeTAKASE, Kei; KAMAJI, Yoshito; IGUCHI, Takafumi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73792J.1-73792J.8Conference Paper

CD Performance Evaluation According to Advanced Marking ParameterYOON, Suk-Ky; KIM, Seung-Yun; YEON, Kyoeong-Mee et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 737924.1-737924.10Conference Paper

GPU-accelerated Inverse Lithography TechniqueJINYU ZHANG; YANGDONG DENG; WEI XIONG et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73790Z.1-73790Z.11Conference Paper

Plasma Optical Emission Analysis for Chamber Condition MonitorZHIGANG MAO; TIECHENG ZHOU; GRIMBERGEN, Michael et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73791U.1-73791U.8Conference Paper

Study of Electric-Field-Induced-Development MethodTERAYAMA, Masatoshi; SAKURAI, Hideaki; SAKAI, Mari et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73791X.1-73791X.8Conference Paper

Thorough characterization of a EUV maskMIZUNO, Hiroyuki; MCINTYRE, Gregory; LA FONTAINE, Bruno et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73790J.1-73790J.11Conference Paper